THIN FILM DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus which can deposit a film in a correct area by preventing any thermal influence from an evaporation source to a mask. SOLUTION: The thin film deposition apparatus comprises a vacuum tank 2 and an evaporation unit 3 for an organic material, and a shutter 7 for controlling the film deposition is provided between a substrate 5 and the evaporation unit 3. A pipe line 71 to circulate a refrigerant 80 such as water is arranged inside a shutter body 70 of the shutter 7 for controlling the film deposition. The shutter body 70 is cooled by introducing the refrigerant 80 into the pipe line 71 from a refrigerant source 8 provided outside the vacuum tank 2. COPYRIGHT: (C)2003,JPO