ORGANOCOPPER COMPOUND FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND COPPER THIN FILM PREPARED BY USING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain an organocopper compound for metal organic chemical vapor deposition, which is readily vaporizable, stably supplied as a raw material in film forming, with which a film-forming speed is improved, a metal organic chemical vapor deposition apparatus is hardly corroded, treatment of exhaust gas in a MOCVD process is not complicated and adhesivity to a substrate film is excellent. SOLUTION: The organometallic compound for metal organic chemical vapor deposition is represented by general formula (1) or formula (2) (R1is a methyl group and R2is an isobutyl group, R1is a methyl group and R2is an isopropyl group or R1is an isobutyl group and R2is a t-butyl group). COPYRIGHT: (C)2003,JPO