| 发明名称 |
SYSTEMS AND METHODS FOR RINSING AND DRYING SUBSTRATES |
| 摘要 |
In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided. |
| 申请公布号 |
US2016181086(A1) |
申请公布日期 |
2016.06.23 |
| 申请号 |
US201514602201 |
申请日期 |
2015.01.21 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Mikhaylichenko Ekaterina;Brown Brian J.;Hanson Kyle M.;Francischetti Vincent S. |
| 分类号 |
H01L21/02;B08B3/08;H01L21/67;H01L21/677 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A system comprising:
a loading position; a drying position; a movable tank configured to:
hold at least one substrate;hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; andtranslate between the loading position and the drying position; and a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. |
| 地址 |
Santa Clara CA US |
