NEGATIVE ION IMPLANT MASK FORMATION FOR SELF-ALIGNED, SUBLITHOGRAPHIC RESOLUTION PATTERNING FOR SINGLE-SIDED VERTICLE DEVICE FORMATION,申请号EP20010987148-传众专利搜索

发明名称	NEGATIVE ION IMPLANT MASK FORMATION FOR SELF-ALIGNED, SUBLITHOGRAPHIC RESOLUTION PATTERNING FOR SINGLE-SIDED VERTICLE DEVICE FORMATION
摘要
申请公布号	EP1342262(A2)	申请公布日期	2003.09.10
申请号	EP20010987148	申请日期	2001.11.29
申请人	INFINEON TECHNOLOGIES NORTH AMERICA CORP.;INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	DIVAKARUNI, RAMA;KUDELKA, STEPHAN;LEE, KIL-HO;MCSTAY, IRENE;SCHROEDER, UWE;TEWS, HELMUT
分类号	H01L21/8242;(IPC1-7):H01L21/763;H01L21/824;H01L21/823	主分类号	H01L21/8242
代理机构		代理人
主权项
地址