| 摘要 |
PROBLEM TO BE SOLVED: To provide a photopolymerizable composition that forms a photosensitive layer having excellent film strength, and has excellent storing stability and sensitivity, the composition being one of photo-radical-polymerizable compositions that are regarded as having the highest sensitivity and are favored particularly in the image forming technology. SOLUTION: This photopolymerizable composition comprises a polymer having a radical-polymerizable group and a unit represented by general formula (I) (wherein Q<SP>1</SP>is a cyano group (CN) or a group represented by the formula: COX<SP>2</SP>; X<SP>1</SP>and X<SP>2</SP>are, each independently, a heteroatom or a halogen atom; and R<SP>a</SP>and R<SP>b</SP>are, each independently, a hydrogen atom, a halogen atom, a cyano group or an organic residue, where X<SP>1</SP>and X<SP>2</SP>, R<SP>a</SP>and R<SP>b</SP>, or X<SP>1</SP>and R<SP>a</SP>or R<SP>b</SP>can bond with each other to form a cyclic structure). COPYRIGHT: (C)2003,JPO
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