| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for forming a three-dimensional photomask which can be easily formed with spacing with high accuracy in forming a contactless state between a mask pattern and a substrate to be exposed and the three-dimensional mask formed by the method. <P>SOLUTION: A planar photomask 1 formed with the mask pattern 2 is installed on a groundsill 4 of a three-dimensional dispenser. The three- dimensional dispenser has a dispenser head 5 movable three-dimensionally relative to the installed planar photomask 1 and a thermosetting resin is applied near the mask pattern 2 on the installed planar photomask 1 by the dispenser head 5. <P>COPYRIGHT: (C)2003,JPO</p> |
