| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a blank for a halftone phase shift mask reduced in a halftone film thickness in a short wavelength region, and a halftone phase shift mask using the same, and a method for transferring patterns using the same. <P>SOLUTION: The blank for the halftone phase shift mask is provided with a phase shift layer mainly having a phase shift effect and a transmittance regulating layer relating mainly to transmittance on a glass substrate. Both of these two-layered films are thin films consisting of a metal silicide or its compound and the transmittance regulating layer of these films is formed of a thin film essentially consisting of metal, silicon and nitrogen. <P>COPYRIGHT: (C)2003,JPO</p> |
