| 摘要 |
PROBLEM TO BE SOLVED: To provide an industrially economical monomer useful as a monomer for a base polymer for improving the insulation, heat resistance and substrate adhesivity of a resin for a liquid crystal device, a photoresist for a semiconductor production process, an antireflection film. SOLUTION: The invention relates to an oxygen-containing alicyclic acrylate compound of formula (1) (R<SP>1</SP>is H or a 1-4C alkyl; R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>are each H or a 1-10C alkyl; Y and Z are each carbonyl or methylene and are different from each other; and X is a halogen atom) and an oxygen-containing alicyclic alcohol compound of formula (2). It also relates to a method for the production of the acrylate compound of formula (1) comprising the reaction of the alcohol compound of formula (2) with an acrylic acid halide of formula (3) in the presence of a base, a method for the production of the oxygen-containing alicyclic acrylate compound of formula (1) comprising the reaction of the alcohol compound of formula (2) with an acrylic acid compound of formula (4) in the presence of an acid catalyst, and a method for the production of the alcohol compound of formula (2) comprising the reduction of an oxygen-containing alicyclic epoxy compound of formula (5). COPYRIGHT: (C)2003,JPO
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