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发明名称
IONIZED METAL PLASMA DEPOSITION PROCESS HAVING ENHANCED VIA SIDEWALL COVERAGE
摘要
申请公布号
EP1342263(A2)
申请公布日期
2003.09.10
申请号
EP20010994718
申请日期
2001.11.22
申请人
KONINKLIJKE PHILIPS ELECTRONICS N.V.
发明人
KLATT, JEFFREY;NORASETTHEKUL, SOMCHINTANA
分类号
C23C14/34;H01L21/28;H01L21/285;H01L21/3205;H01L21/768;H01L23/52;(IPC1-7):H01L21/768
主分类号
C23C14/34
代理机构
代理人
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地址
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