| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoreceptor which suppresses the internal stress of a film, has an excellent adhesion property, is thereby reduced in the thickness of a substrate, is inexpensive and is provided with stable quality. SOLUTION: The photoreceptor comprises coating the surface of the substrate 3 with a photosensitive layer 4 consisting of an amorphous silicon layer, in which the amorphous silicon layer is deposited by a catalytic CVD process; the catalytic medium used for the catalytic CVD process is formed of a catalytic element selected from Ta, W and Mo; and the catalytic element is incorporated into the amorphous silicon layer at an atomic ratio of from 0.5 ppm to 15%. COPYRIGHT: (C)2003,JPO
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