| 摘要 |
A vapour deposited coating on the surface of a metal, such as a stainless steel substrate, obtained in a plasma vapour depositing device having magnetic vapour stream filtering means. The vapour deposited coating comprises pairs of a metal layer and a ceramic metal compound ("ceramic") layer. The metal layer deposited is one of titanium, chromium, vanadium, aluminum, molybdenum, niobium, tungsten, zirconium, hafnium or alloys ofthese metals. The ceramic layer is a nitride, carbonitride, carbide, oxycarbide or oxynitride of one or an alloy of the above metals. The substrate surface is optionally ion nitride prior to the vapour deposition of the metal-ceramic layers. The substrate bearing pairs of metal-ceramic layers may be subsequently heat treated. The obtained coating on a metal substrate exhibits high wear resistance and hardness and low surface roughness.
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