| 摘要 |
Tantalum and niobium aluminum-doped hydrated mixed metal oxide sols may be made by a process comprising combining a first metal compound aluminum alkoxide, with a second metal compound selected from the group consisting of niobium alkoxide and tantalum alkoxide, and mixtures thereof to provide a substantially water-free precursor and combining the precursor with a ketone to provide a hydrated mixed metal oxide sol, wherein the ketone is substantially free of water. The sol may then be processed to obtain thin films, fibers, crystals (both micro- and meso-porous), powders and macroscopic objects and to provide mixed metal oxide that may be used in a variety of components of integrated circuits.
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