| 摘要 |
A scanning exposure method includes relatively moving a mask and an illuminated area of an exposure beam during a scanning exposure, an image of a pattern of said mask being projected onto a substrate through a projection system; and performing, during the scanning exposure, an imaging adjustment in order to compensate for change of the image projected onto the substrate that would be caused by a scanning error of the mask, the scanning error causing a positional variation of a pattern surface of the mask along an axis of the projection system.
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