发明名称 |
Forming a pattern of a negative photoresist |
摘要 |
A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.
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申请公布号 |
US6617086(B2) |
申请公布日期 |
2003.09.09 |
申请号 |
US20010796445 |
申请日期 |
2001.03.02 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANGELOPOULOS MARIE;BABICH EDWARD D.;BABICH INNA V.;BABICH KATHERINA E.;BUCCHIGNANO JAMES J.;PETRILLO KAREN E.;RISHTON STEVEN A. |
分类号 |
G03F7/033;C08F20/26;G03F7/038;G03F7/075;H01L21/027;(IPC1-7):G03C3/00;G03F7/30 |
主分类号 |
G03F7/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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