发明名称 ARC DISCHARGE TYPE REACTION FACILITY
摘要 PROBLEM TO BE SOLVED: To provide an arc discharge type reaction facility capable of surely generating a decomposition reaction and a synthetic reaction, or the like, by expanding an area in which arc exists, and effectively promoting these reactions. SOLUTION: The arc discharge type reaction facility 1 has a housing 3 whose one end has a gas inlet 8 and the other end has a gas outlet 9, two electrode plates 10 and 11 installed inside the housing 3 so as to oppose to each other in order to introduce gas to be reacted from the gas inlet 8 to the gas outlet 9 and forming a gas flow passage P between the opposing faces, and a power supply 12 for applying a discharge voltage between both the electrode plates 10 and 11 in a state that the gas to be reacted is circulated in the gas flow passage P. An arc discharge generating area A<SB>1</SB>formed by approaching the gas inlet 8 side to both the electrode plates 10 and 11 and an arc discharge generating area A<SB>2</SB>formed by gradually increasing the distance (d) between both the electrode plates 10 and 11 from the arc discharge generating area A<SB>1</SB>toward the gas outlet 9 side exist in the gas flow passage P. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003251176(A) 申请公布日期 2003.09.09
申请号 JP20020052081 申请日期 2002.02.27
申请人 FAAREKKUSU:KK 发明人 TAMARU SHIGERU;KIMURA HIDEO
分类号 F01N3/08;B01J19/08;(IPC1-7):B01J19/08 主分类号 F01N3/08
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