发明名称 Recovery method for platinum plating bath
摘要 A recovery system for platinum electrolytic baths operating at low current densities is disclosed. An oxidizing system is provided in a closed-loop recirculation system for platinum plating at low current densities. The oxidizing system reoxidizes Pt+2 ions, which are typically formed at low current densities, to Pt+4 ions by using oxidizers, for example peroxide. A sensor may be also provided to detect the relative concentration of [Pt+2] ions to [Pt+4] ions and to tailor the relative concentrations to a predetermined level.
申请公布号 US6616828(B2) 申请公布日期 2003.09.09
申请号 US20010921781 申请日期 2001.08.06
申请人 MICRON TECHNOLOGY, INC. 发明人 CHOPRA DINESH
分类号 C25D21/12;C25D21/18;(IPC1-7):C25D7/12;C25D3/50;C25D21/06 主分类号 C25D21/12
代理机构 代理人
主权项
地址