发明名称 Oscillation mechanism in exposure apparatus
摘要 An oscillation mechanism includes a measuring device for measuring a position of an object, a movable stage being arranged so as to be positioned with respect to the object, a driving mechanism for moving the stage, a control unit for controlling the driving mechanism on the basis of an output of the measuring device, an oscillation element mounted on the stage, which is arranged to be oscillated with respect to the stage, and an intermediate element having a predetermined mass, which is disposed between the stage and the oscillation element. The intermediate element is (i) connected to the oscillation element through a first spring element having a predetermined spring constant, and (ii) connected to the stage through a second spring element having a predetermined spring constant. The oscillation mechanism also includes an oscillation unit for oscillating the oscillation element by oscillating the intermediate element at a predetermined frequency.
申请公布号 US6618146(B1) 申请公布日期 2003.09.09
申请号 US20000670541 申请日期 2000.09.27
申请人 CANON KABUSHIKI KAISHA 发明人 HASEGAWA TAKAYUKI
分类号 B06B1/06;G03F7/20;H01L21/027;H01L41/09;H05H13/04;(IPC1-7):G01B11/00 主分类号 B06B1/06
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