METHOD FOR PRODUCING PHOTOMASK, DRAWING DEVICE, INSPECTION METHOD FOR PHOTOMASK, INSPECTION DEVICE FOR PHOTOMASK AND METHOD FOR PRODUCING DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a photomask capable of enhancing the coordinate precision of a pattern formed on a transferred body.SOLUTION: There is provided a method for producing a photomask which comprises: a step of preparing pattern design data; a step of preparing thickness distribution data T exhibiting a thickness distribution of a substrate; a step of preparing transfer surface shape data C exhibiting a shape of a main surface when holding the photomask in an exposure device; a step of obtaining drawing difference data F using the thickness distribution data T and the transfer surface shape data C; a step of determining drawing coordinate shift amount data G by calculating a coordinate shift amount at a plurality of points on the main surface corresponding to the drawing difference data F; and a drawing step of drawing a pattern on the photomask blank using the drawing coordinate shift amount data G and the pattern design data.SELECTED DRAWING: Figure 8