| 摘要 |
PROBLEM TO BE SOLVED: To realize a treatment device before wafer inspection capable of improving analysis precision further by devising a drying means used in a treatment process before inspection. SOLUTION: In this treatment device before wafer inspection constituted in such a way that a naturally oxidized film formed on a surface of a silicon wafer 7 (8) is made to react to hydrofluoric acid steam or hydrofluoric acid solution to be dissolved, and liquid droplets S of the dissolved liquid collected in a predetermined section on the silicon wafer are dried by the drying means 9 to process into a dried trace for measuring and analyzing degree of pollution, the drying means 9 is provided with a light source part 15 incorporating a lamp 17 and a light introducing bar 25 extended from the light source part and having a light projection face at a tip. COPYRIGHT: (C)2003,JPO
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