发明名称 CIRCUIT PLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a plating solution agitating method which ensures excellent film quality and via hole filling property to a having via holes and resist thereon with excellent reproducibility when performing electric plating on a printed circuit board. SOLUTION: When performing the electric plating of a circuit 4 such as a printed circuit board and a semi-conductor substrate, the plating solution 2 is agitated by ejecting or blowing the plating solution against wall surfaces or a bottom surface of a plating tank 1 to generate a reflection flow, inserting the 4 and an anode plate 3 in the reflection flow so as to be parallel to the direction of the reflection flows 9, 10 and 11. The plating of homogenons, uniform and excellent quality is performed thereby. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003247099(A) 申请公布日期 2003.09.05
申请号 JP20020045056 申请日期 2002.02.21
申请人 HITACHI LTD;NITTO DENKO CORP 发明人 MURAO KENJI
分类号 C25D5/08;C25D7/00;C25D7/12;C25D21/10;H05K3/18;(IPC1-7):C25D21/10 主分类号 C25D5/08
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