| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for overlapping substrates which can make aligning accuracy for an overlap location high without using a high accuracy stage and an optical system for observing marks, etc. <P>SOLUTION: In the method for overlapping two substrates 41, 43 having micro lenses 42, 44, a first protruding alignment mark 48 is formed on the first substrate 41, and a recessed second alignment mark 51 is formed on the second substrate 43 so as to have a dimension for permitting intrusion of at least a part in the vicinity of a top of the first alignment mark 48. The part in the vicinity of the top of the first protruding alignment mark 48 intrudes into the second recessed alignment mark 51, and the first and the second substrates 41, 43 are overlapped. The positioning accuracy for the overlap location can be high without using the high accuracy stage and the optical system for observing the marks, etc. <P>COPYRIGHT: (C)2003,JPO |
