| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system and an exposure control method capable of easily detecting a defective pattern due to defocusing without deteriorating high manufacturing efficiency. SOLUTION: A reticle stage 13, an image projection system 14, an alignment system 15, and a wafer stage 16 are arranged in a thermostatic chamber 10 also having a lighting system 11. A focus value measuring mechanism 19 utilizes an automatic focusing mechanism 18 for measuring a focus value for each shot region, and stores the measurements in a memory 20. An arithmetic unit 21 compares focus values for specified shot regions with each other, out of the measured focus values, and differences between the focuses are compared with a predetermined value for evaluation. Then, shot regions in conformity with the evaluation by the arithmetic unit 21 are exposed one after the other while those not in conformity with the evaluation are left unexposed. COPYRIGHT: (C)2003,JPO
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