| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin-film-forming apparatus and a thin-film-forming method that can easily and efficiently prepare a superfine pattern, a manufacturing apparatus for a circuit pattern and a manufacturing method for a circuit pattern and electronic equipment, and a manufacturing apparatus of a resist pattern and a manufacturing method of a resist pattern. <P>SOLUTION: A thin-film-forming apparatus 1 forms a thin film by coating a substrate SUB with a coating liquid L, and has a movement mechanism 4 for placing the substrate to move the substrate in a first direction and a second direction crossing the first one, a first droplet discharge head 2 for discharging the coating liquid onto the substrate that is moved in the first direction by the movement mechanism, a second droplet discharge head 3 for discharging the coating liquid onto the substrate that is moved in the second direction by the movement mechanism, and a control section C for controlling the movement operation of the movement mechanism and the discharge of the coating liquid in the first and second droplet discharge heads. <P>COPYRIGHT: (C)2003,JPO |
