| 摘要 |
PROBLEM TO BE SOLVED: To provide a CVD thin film deposition apparatus having a step of collecting organic metal compounds from used raw materials with a trap which can recycle more metal compounds without increasing the trap capacity. SOLUTION: In the LPCVD apparatus comprising a vessel body to accommodate metal compounds as raw materials, a heating means which heats the vessel body to vaporize the organic metal compounds into raw gas, a reactor to store a substrate with a thin film deposited thereon, an evacuation pump to keep the reactor at a low pressure atmosphere, and the trap to cool used raw gas from the reactor, the trap has a cylinder having a honeycomb structure in a flow passage through which the used raw materials flow. COPYRIGHT: (C)2003,JPO
|
