发明名称 SOLID IMAGING DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To solve a problem that a sensitivity in a blue area is decreased and void causing decrease in sensitivity is generated, further, restriction is generated in the choice of the kind of film whereby a refractive index cannot be selected within a wide range when transparent films having different refractive indexes are formed stepwise. SOLUTION: In a solid imaging device having a waveguide passage structure, a hole section 17 is opened on a photo detecting sensor unit 12 in an interlayer insulation film 16, then, a laminated waveguide passage 18 of a multilayered structure consisting of three sets for example of waveguide films 19, 20, 21 having the difference of refractive indexes in an interface between a low refractive index layer and a high refractive index layer in respective sets, is formed in the inner surface of the hole section 17. Light of incidence obliquely incident into the surface of the photo detecting sensor unit 12 is condensed efficiently onto the photo detecting sensor unit 12 by the total reflection effect in respective waveguide films 19, 20, 21 having the function of the waveguide passage. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003249633(A) 申请公布日期 2003.09.05
申请号 JP20020047472 申请日期 2002.02.25
申请人 SONY CORP 发明人 SAKAI CHIAKI
分类号 H01L27/14;H04N5/335;H04N5/369;(IPC1-7):H01L27/14 主分类号 H01L27/14
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