发明名称 pn JUNCTION TYPE BORON PHOSPHIDE GROUP SEMICONDUCTOR LIGHT EMITTING ELEMENT AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To suppress an external diffusion of a IV-element from a light emitting layer in a boron phosphide group semiconductor light emitting element, and to maintain an atom concentration of the IV-element in the light emitting layer at optimum concentration from the viewpoint of light emission intensity. <P>SOLUTION: The boron phosphide group semiconductor light emitting element is provided with the light emitting layer consisting of a first boron phosphide group semiconductor layer, and a III-V semiconductor layer obtained by intentionally adding the IV-element and pn junction type hetero junction structure consisting of a second boron phosphide group semiconductor layer. The first boron phosphide group semiconductor layer is constituted of an undoped first conductive boron phosphide group semiconductor containing the IV-element, and the second boron phosphide group semiconductor layer is constituted of a second conductive boron phosphide group semiconductor layer containing the IV-element. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003249679(A) 申请公布日期 2003.09.05
申请号 JP20020047457 申请日期 2002.02.25
申请人 SHOWA DENKO KK 发明人 UDAGAWA TAKASHI
分类号 H01L21/205;H01L33/14;H01L33/30 主分类号 H01L21/205
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