发明名称 INTERFEROMETER, APPARATUS AND METHOD FOR EXPOSURE
摘要 PROBLEM TO BE SOLVED: To provide an interferometer which has an extremely small measuring error without introducing lateral deviations of a measuring light and a reference light and to provide an apparatus for exposure using the interferometer and a method for the exposure using the apparatus. SOLUTION: The interferometer 2 detects the measuring light via a moving mirror 24 and the reference light via a fixed mirror by dividing a light from a light source 10 to the measuring light and the reference light, reflecting the measuring light by the mirror 24 having at least two reflecting surfaces which linearly move from each other and reflecting the reference light by the fixed mirror. The interferometer 2 comprises optical members 16, 18 for reversely advancing the incident measuring light to an incident direction, emitting the measuring light by deviating the position to the incident measuring light, and emitting the measuring light in a state in which the direction and the amount of the deviation of the incident position when the incident position of the measuring light is deviated due to the positional deviation of the moving mirror. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003247804(A) 申请公布日期 2003.09.05
申请号 JP20020050617 申请日期 2002.02.27
申请人 NIKON CORP 发明人 HIDAKA YASUHIRO;KAWAGUCHI TORU
分类号 G01B9/02;G01B11/00;G03F7/20;H01L21/027;(IPC1-7):G01B9/02 主分类号 G01B9/02
代理机构 代理人
主权项
地址