| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method for enabling a satisfactory transfer even if detection cannot be made or a detection error becomes large in some focus sensors when a region to be exposed is positioned at an exposure position. SOLUTION: When exposure is to be made at an exposure position where some focus sensors are ineffective, for example the periphery of a wafer, focus measurement is carried out at a spare measurement position where all focus sensors become effective before exposure, the focus measurement value is corrected based on an error due to a pattern structure obtained in advance, and the posture of the wafer is adjusted based on the corrected result. COPYRIGHT: (C)2003,JPO |
