发明名称 ELECTRON BEAM IRRADIATION EQUIPMENT AND ELECTRON BEAM IRRADIATION METHOD
摘要 PROBLEM TO BE SOLVED: To realize highly precise recording by easily and correctly focusing electron beam corresponding to an original recording 1 in an electron beam irradiating equipment which records data with irradiation of the electron beam to the original recording 1. SOLUTION: A focusing stage 30, which is positioned alongside the original recording 1 and is equipped with a knife edge 134 and a Faraday cup 131, is arranged on a slide table 6 of a supporting mechanism 2 which supports the original recording 1. When recording, the electron beam first irradiates the focusing stage 30 for focusing, then the original recording 1 for recording. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003249188(A) 申请公布日期 2003.09.05
申请号 JP20020049258 申请日期 2002.02.26
申请人 JEOL LTD;SONY CORP 发明人 NORIOKA SETSUO;MIYOKAWA TOSHIAKI;DATE NAOKI;SASAKI JUN;AKI YUICHI;MIURA YOSHIHISA
分类号 G21K5/04;A61N5/00;G01N23/00;G01Q30/02;G01Q30/20;G01T1/29;G11B7/004;G11B7/09;G11B7/26;G21G5/00;H01J37/04;H01J37/18;H01J37/20;H01J37/21;H01J37/252;H01J37/304;H01J37/305;(IPC1-7):H01J37/305 主分类号 G21K5/04
代理机构 代理人
主权项
地址