| 摘要 |
PROBLEM TO BE SOLVED: To provide a material feeder for vacuum vapor deposition which can continuously feed a large number of tablets, and feed a sufficient amount of a material for film deposition even in performing film deposition of the thickness exceeding 200μm. SOLUTION: This material feeder comprises: a rotatable turret; a moving means having a moving member to move the material for film deposition to a predetermined position of vapor deposition by moving the material for film deposition charged in the turret in the direction of the axis of rotation of the turret; and a turret rotating means. The turret has a plurality of through holes for movement with the moving member passing therethrough corresponding to the position for charging the material for film deposition, and the moving member and the through holes for movement are located on the circumference of the same size as that of the turret around the center of rotation of the turret. COPYRIGHT: (C)2003,JPO
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