发明名称 |
Stage apparatus, exposure apparatus and method for exposing substrate plate |
摘要 |
The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
|
申请公布号 |
US2003164934(A1) |
申请公布日期 |
2003.09.04 |
申请号 |
US20030361495 |
申请日期 |
2003.02.11 |
申请人 |
NIKON CORPORATION |
发明人 |
NISHI KENJI;KIUCHI TORU |
分类号 |
B23Q1/00;B23Q1/26;B23Q1/62;G03F7/20;H01L21/027;H01L21/68;H01L21/683;(IPC1-7):G03B27/58 |
主分类号 |
B23Q1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|