发明名称 Composition for stripping resists
摘要 Disclosed is a stripping composition for removing resist, comprising 5-50% by weight of at least one product obtained from the reaction of alkyl acetoacetate or acetic acid with fatty acid amine, and 50-95% by weight of a solvent selected from the group consisting of water, an aqueous 25 wt % tetramethyl ammonium hydroxide solution, glycol, and organic polar solvents. The stripping composition is so excellent in terms of stripability as to require only a rinsing process with ultra-pure water without passing through a stripping composition removal process with an air knife and a rinsing process with isopropyl alcohol. Also, with low volatility and toxicity, the composition produces as little pollution of the environment as possible, in addition to not encroaching on metal undercoats and pipe substrates such as O-rings, even without corrosion preventives.
申请公布号 US2003166482(A1) 申请公布日期 2003.09.04
申请号 US20020133900 申请日期 2002.04.29
申请人 DUKSUNG CO., LTD. 发明人 CHOI HO SUNG;KIM JI HONG;KIM TAE GEWN;YEO SANG HYEUK;PARK HAE SUNG
分类号 C11D7/26;C11D7/32;C11D7/34;C11D7/50;G03F7/42;H01L21/306;H01L21/311;(IPC1-7):C11D1/00 主分类号 C11D7/26
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