发明名称 Coating composition and method for preparing radiation sensitive plate useful in lithographic printing and the like
摘要 The invention relates to new radiation sensitive coating compositions and coating product which are radiation sensitive in the infrared region closed to the infrared, comprising two layers, the first layer comprising a hiding polymer and one or more infrared absorbing material which absorbs in the desired wavelength and a second layer coated on the first layer comprising one or more copolymer which is able to coat and make the polymer of the first layer insoluble in the conventional developer of positive plates, and when applied to an appropriate substrate is useful as off-set lithographic printing plates, for color proofing films and photoresist. The invention also refers to a printing or imaging process.
申请公布号 US2003165774(A1) 申请公布日期 2003.09.04
申请号 US20030343234 申请日期 2003.05.02
申请人 ARIAS ANDRE LUIZ;ARIAS LUIZ NEI;ARIAS MARJORIE;PROVENZANO MARIO ITALO 发明人 ARIAS ANDRE LUIZ;ARIAS LUIZ NEI;ARIAS MARJORIE;PROVENZANO MARIO ITALO
分类号 G03F7/004;B41C1/10;B41M5/36;B41M5/40;B41M5/46;C09D161/06;C09D161/24;C09D161/30;G03F7/00;G03F7/11;(IPC1-7):G03F7/038 主分类号 G03F7/004
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