| 摘要 |
<p>A plasma processing device for introducing a processing gas into an air-tightly-formed processing container, applying a high-frequency power to generate plasma, and plasma-processing an element to be processed disposed in the container. The device comprises an electrode unit provided in the container and having an electrode for applying the high-frequency power, and a space provided in the electrode unit, for insulating the electrode from the container, the space communicating with the atmosphere outside the container.</p> |
