发明名称 PHOTOSENSITIVE POLYMER FOR OPTICAL MICRO PROCESS AND MULTIFUNCTIONAL SENSOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING THE POLYMER
摘要 PURPOSE: A photosensitive polymer for an optical micro process and a multifunctional sensor and a photosensitive resin composition containing the polymer are provided, to allow a micro pattern to be obtained by the selective developing using the large difference of solubilities of deprotected and undeprotected parts and to achieve a fluorescent image. CONSTITUTION: The photosensitive polymer comprises a precursor of an anthraquinone or naphthacenequinone derivative having at least two phenol groups, wherein the phenol groups are substituted with the functional groups capable of participating in the acid-liable functional group and radial polymerization. Preferably the anthraquinone or naphthacenequinone derivative is selected from the group consisting of quinizarin, leucoquinizarin, 1,5-dihydroxyanthraquinone, 2,6-dihydroxyanthraquinone, 1,8-dihydroxyanthraquinone, 1,4-diaminoanthraquinone, 1,5-diaminoanthraquinone, 2,6-diaminoanthraquinone, 1,8-diaminoanthraquinone and 6,11-dihydroxy-5,12-naphthacenedione. Preferably the polymer has a number average molecular weight of 10,000-100,000. Preferably the photosensitive resin composition comprises 100 parts by weight of the polymer and 1-5 parts by weight of a photoacid generator.
申请公布号 KR20030070957(A) 申请公布日期 2003.09.03
申请号 KR20020010431 申请日期 2002.02.27
申请人 LEE, CHAN WOO;LEE, SUCK HYUN;YOON, HO SUNG 发明人 KIM, YEONG BEOM;LEE, CHAN WOO;LEE, SUCK HYUN;YOON, HO SUNG
分类号 G03F7/039;C08F12/22;C08F20/30;C08F220/18;G03F7/033;(IPC1-7):C08F220/18 主分类号 G03F7/039
代理机构 代理人
主权项
地址