摘要 |
PURPOSE: A photosensitive polymer for an optical micro process and a multifunctional sensor and a photosensitive resin composition containing the polymer are provided, to allow a micro pattern to be obtained by the selective developing using the large difference of solubilities of deprotected and undeprotected parts and to achieve a fluorescent image. CONSTITUTION: The photosensitive polymer comprises a precursor of an anthraquinone or naphthacenequinone derivative having at least two phenol groups, wherein the phenol groups are substituted with the functional groups capable of participating in the acid-liable functional group and radial polymerization. Preferably the anthraquinone or naphthacenequinone derivative is selected from the group consisting of quinizarin, leucoquinizarin, 1,5-dihydroxyanthraquinone, 2,6-dihydroxyanthraquinone, 1,8-dihydroxyanthraquinone, 1,4-diaminoanthraquinone, 1,5-diaminoanthraquinone, 2,6-diaminoanthraquinone, 1,8-diaminoanthraquinone and 6,11-dihydroxy-5,12-naphthacenedione. Preferably the polymer has a number average molecular weight of 10,000-100,000. Preferably the photosensitive resin composition comprises 100 parts by weight of the polymer and 1-5 parts by weight of a photoacid generator.
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申请人 |
LEE, CHAN WOO;LEE, SUCK HYUN;YOON, HO SUNG |
发明人 |
KIM, YEONG BEOM;LEE, CHAN WOO;LEE, SUCK HYUN;YOON, HO SUNG |