| 摘要 |
An apparatus for removing selected metal ions from a plasma includes a plasma chamber and at least one silica substrate (32,34) mounted inside the chamber. More specifically, the substrate is exposed in the chamber so that when metal ions (14,16) from the plasma (12) contact the substrate they diffuse into the substrate to create a liquified layer (36,38). A receptacle (42,44) is also provided to receive the liquid from the layer as it flows from the substrate.
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