发明名称 Semiconductor device and method for producing the same
摘要 In producing a semiconductor device by annealing with laser light irradiation, while a linear laser light is scanned in a direction perpendicular to a line, the annealing is performed for a semiconductor material. In this state, since an anneal effect in a beam lateral direction corresponding to a line direction is 2 times or more different than that in the scanning direction, a plurality of semiconductor elements are formed along a line direction in which the linear laser light is irradiated. Also, a line direction connecting the source and drain region of a thin film transistor is aligned to the line direction of the linear laser light.
申请公布号 US6613619(B2) 申请公布日期 2003.09.02
申请号 US20010840167 申请日期 2001.04.24
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KUSUMOTO NAOTO;TANAKA KOICHIRO
分类号 H01L21/02;H01L21/20;H01L21/268;H01L21/336;H01L21/77;H01L27/12;H01L29/04;H01L29/786;(IPC1-7):H01L21/84 主分类号 H01L21/02
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