发明名称 |
Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same |
摘要 |
A photosensitive polymer having a phenyl ring and a lactone group, and a resist composition, wherein the resist composition contains a photosensitive polymer including a monomer unit having at least one group selected from the groups indicated by the following formulas, and a photoacid generator (PAG).
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申请公布号 |
US6613492(B2) |
申请公布日期 |
2003.09.02 |
申请号 |
US20010933042 |
申请日期 |
2001.08.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE SI-HYEUNG |
分类号 |
C08F12/22;C08F20/30;G03F7/039;H01L21/027;(IPC1-7):G03C7/038 |
主分类号 |
C08F12/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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