| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a PFC decomposition method which enables more efficient decomposition of a PFC gas by enhancing the decomposition ratio of the PFC gas, a PFC decomposition apparatus and a method for manufacturing a semiconductor device. <P>SOLUTION: The PFC decomposition apparatus is equipped with a chamber in the PFC decomposition apparatus 14 into which the PFC gas discharged from a processing apparatus 10 such as a semiconductor manufacturing apparatus is introduced, a mechanism for generating plasma in the PFC decomposition chamber and a mechanism 16 for supplying an oxidizing gas into the PFC decomposition chamber. The PFC gas is decomposed by the plasma in the decomposition chamber and chemically reacted with the oxidizing gas to detoxify the PFC gas. The oxidizing gas supplied from the supply mechanism 16 is gas containing KMnO<SB>4</SB>or OsO<SB>4</SB>. The decomposition ratio of the PFC gas is enhanced to efficiently decompose the PFC gas. <P>COPYRIGHT: (C)2003,JPO</p> |
