发明名称 |
Multi-beam shaped beam lithography system |
摘要 |
A multi-beam shaped-beam electron beam lithography system employs conventional lenses and magnetic deflectors, with an array of lithographically fabricated electrodes disposed about a central axis to simultaneously and independently deflect electron beams in beamlet exposure ranges separated transversely from one another within a subfield, so that subfields overlap.
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申请公布号 |
US6614035(B2) |
申请公布日期 |
2003.09.02 |
申请号 |
US20020059786 |
申请日期 |
2002.01.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HARTLEY JOHN G. |
分类号 |
G21K1/08;H01J37/317;(IPC1-7):G03F9/00 |
主分类号 |
G21K1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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