发明名称 MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a semiconductor device in which a mounting area is reduced, a wireless miniaturized package is obtained and a fine conductive pattern form can be obtained. <P>SOLUTION: A conductive pattern is formed by working a metal film over a supporting substrate by lithography and etching and after a semiconductor chip is fixed, the semiconductor chip and the conductive pattern are connected by a metal piece. After sealing with insulating resin, the supporting substrate is removed and the conductive pattern is exposed from the insulating resin. The fine conductive pattern can be formed, the package is miniaturized, the mounting area is reduced and heat radiation characteristics can be improved. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243594(A) 申请公布日期 2003.08.29
申请号 JP20020021632 申请日期 2002.01.30
申请人 SANYO ELECTRIC CO LTD 发明人 KUBO HIROTOSHI
分类号 H01L23/12;H01L23/48;H01L25/04;H01L25/18 主分类号 H01L23/12
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