| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming micropolograms in a transparent compound, semiconductor, organic matter or metal by interfered laser pulses having a high energy density and these hologram. SOLUTION: The method of manufacturing the holograms by a two-beam interference exposure method comprising using a solid-state laser emitting a laser beam of 900 femtosecond <τ≤100 picosecond in pulse widthτand≥10μJ/pulse in laser power having coherence as a light source and irreversibly recording the surface relief type hologram on the surface of a base material or the buried hologram within the base material by bisecting the pulse light from the laser, temporally and spatially controlling the two beams, condensing these beams onto or into the base material for recording the hologram, and temporally and spatially aligning the convergent spots of the two beams. COPYRIGHT: (C)2003,JPO
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