发明名称 RETICLE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a reticle hard to break even in the case that a membrane region is provided in the neighborhood of the outer periphery of the reticle in the reticle used for charged particle beam transfer exposure of an electron beam, an ion beam or the like. <P>SOLUTION: In the reticle having a plurality of membrane regions supported with a support part, a deep groove or a through hole is provided in the support part in the neighborhood of the membrane region nearest to the outer periphery of the reticle. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003243285(A) 申请公布日期 2003.08.29
申请号 JP20020036150 申请日期 2002.02.14
申请人 NIKON CORP 发明人 IRITA TAKESHI
分类号 G03F1/20;G03F1/68;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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