发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reliably improve a breakdown voltage in an ultra high-speed field effect transistor. SOLUTION: Under a channel layer 108 where a gate electrode 111 is formed, upper and lower subchannel layers 106 and 104 are formed via a barrier layer 107 between channels where the energy level of a conduction band is higher than the channel layer 108. In the upper subchannel layer 106, the energy level of the conduction band is higher than the channel layer 108, and at the same time is lower than the barrier layer 107 between channels. In the lower subchannel layer 104, the energy level of the conduction band is higher than the upper subchannel layer 106, and at the same time is lower than the barrier layer 107 between channels. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243421(A) 申请公布日期 2003.08.29
申请号 JP20020040935 申请日期 2002.02.19
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ISHIDA HIDETOSHI
分类号 H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L21/338 主分类号 H01L29/812
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