发明名称 SUBSTRATE TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate treatment device which carries out highly precise treatment and does not generate static electricity. <P>SOLUTION: A body 2 of a substrate treatment device 1 is provided with; an integrated stone stage 3 which less changes its shape due to a temperature change and prevents the generation of static electricity at a substrate 90; a bridge structure 4 having a discharge system 40 for discharging a resist solution and elevating mechanisms 44, 45 for making the discharge system 40 move up and down in the Z-axial direction; linear motors 50, 51 for moving the bridge structure 4 in the X-axial direction; and a pair of traveling rails 31 in both sides of the holding surface 30 of the stage 3. When the substrate 90 is treated, the stage 3 holds the substrate 90 in a prescribed position and a control system 6 controls the position of the discharge system 40. <P>COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243489(A) 申请公布日期 2003.08.29
申请号 JP20020036399 申请日期 2002.02.14
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KISE KAZUO
分类号 G03F7/16;B05B1/04;H01L21/027;H01L21/68;H01L21/683 主分类号 G03F7/16
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