发明名称 METHOD FOR SUPPRESSING VARIATION IN DIMENSION IN POLYIMIDE ETCHING
摘要 PROBLEM TO BE SOLVED: To provide a method for suppressing variation in dimensions in wet etching of polyimide in the production of wiring-integrated suspension. SOLUTION: In this production method, a surface of an insulation layer is smoothed and, thereby, the insulation layer is stabilized by perceiving a surface active agent and utilizing the effect of the surface active agent in order to etch the insulation layer with excellent working precision on the production of wiring-integrated suspension. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003242734(A) 申请公布日期 2003.08.29
申请号 JP20020034853 申请日期 2002.02.13
申请人 FUCHIGAMI MICRO:KK 发明人 KOSHIMUTA SATOSHI;HAGIWARA SHIGENOBU
分类号 G11B5/60;G11B21/21;(IPC1-7):G11B21/21 主分类号 G11B5/60
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