发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device operable with high performance and at a high withstanding voltage. SOLUTION: A source of an NMOS transistor 1 is connected to ground, its drain is connected to a source of a high withstanding voltage NMOS transistor 4 via an inductor 5, and a drain of the high withstanding voltage NMOS transistor 4 is connected to a power supply line Vdd via an inductor 3. When an output Vout is extracted from the drain of the high withstanding voltage NMOS transistor 4 and an input voltage Vin is given to the gate of the NMOS transistor 1 and a bias voltage Vg2 is given to the gate of the high withstanding voltage NMOS transistor 4, the NMOS transistor 1 and the high withstanding voltage NMOS transistor 4 are operated, the amplitude of the voltage of the high withstanding voltage NMOS transistor 4 to which the inductor 3 is connected, swings around the power supply voltage as a center, and as the output voltage increases, the amplitude of the voltage is increased. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003243938(A) 申请公布日期 2003.08.29
申请号 JP20020038459 申请日期 2002.02.15
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIRAMA TETSUYA;KOMURASAKI HIROSHI
分类号 H03F1/22;H03F3/193;(IPC1-7):H03F1/22 主分类号 H03F1/22
代理机构 代理人
主权项
地址