| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method, where gray scaling is performed with a relatively high throughput, and a device is manufactured at a relatively high yield. SOLUTION: Two or more patterned projection beams having different patterns and intensities are simultaneously projected on a substrate. The gray scaling is realized by making component projection beams PB1-PB4 pass variable attenuaters VA1-VA4, respectively, to generate individual intensities I1-I4 which are arbitrarily selected. COPYRIGHT: (C)2003,JPO
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