| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method which is improved in throughput, capable of saving intermediate rinses, and diminishing a drainage disposal cost by dispensing with an intermediate rinse process. SOLUTION: At first, a substrate is rotated at a low speed by a spin chuck. In this state, a remover is fed to the surface of the substrate W from a remover feed mechanism so as to remove reaction products on the substrate W. Then, the remover is stopped, and then pure water is supplied from a pure water feed mechanism. After the substrate is cleaned with the pure water, the pure water is stopped. The substrate W is rotated at high speed by the spin chuck to enable the pure water left on the substrate W to fly away and dried out. COPYRIGHT: (C)2003,JPO |
