发明名称 INSULATION TYPE SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To obtain an inexpensive insulation type semiconductor device, in which a thermal stress or a thermal strain generated upon manufacturing or operating is reduced and the fear of deformation, denaturation or destruction of respective members is eliminated. <P>SOLUTION: The insulation type semiconductor device is constituted of a ceramics sheet having the thickness of 0.25-1.25 mm, a wiring metallic layer, provided on one of the main surface of the ceramics sheet and having the thickness of 0.1-2.3 mm, and a rear surface metallic layer, provided on the other main surface of the ceramics sheet and having the thickness of 0.025-2.0 mm. The wiring metallic layer and the rear surface metallic layer are constituted of a circuit substrate consisting of an aluminum alloy having the same quality and the same physical property, a semiconductor element substrate, fixed to the wiring metallic layer, and a supporting member fixed to the rear surface metallic layer. <P>COPYRIGHT: (C)2003,JPO</p>
申请公布号 JP2003243610(A) 申请公布日期 2003.08.29
申请号 JP20020040917 申请日期 2002.02.19
申请人 HITACHI LTD 发明人 KURIHARA YASUTOSHI;TAKAHASHI YOSHIMASA;KODAMA HIRONORI;IIZUKA MAMORU;KOYAMA KENJI
分类号 H01L23/36;H01L23/48;H01L25/07;H01L25/18;(IPC1-7):H01L25/07 主分类号 H01L23/36
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